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alchetron.com
Plasma immersion ion implantation - Alchetron, the free social encyclopedia
Plasmaimmersion ion implantation (PIII) or pulsedplasma doping (pulsed PIII) is a surface modification technique of extracting the accelerated ions from the plasma by applying a high voltage pulsed DC or pure DC power supply and targeting them into a suitable substrate or electrode with a semicond
Jun 26, 2018
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